Published May 2017 | Version v1
Journal article

Atomic resolution imaging of YAlO3: Ce in the chromatic and spherical aberration corrected PICO electron microscope

  • 1. Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons, Jülich-Aachen Research Alliance (JARA), Forschungszentrum Jülich GmbH, 52425 Jülich (Germany)
  • 2. Central Facility for Electron Microscopy, RWTH Aachen University, 52074 Aachen (Germany)
  • 3. School of Electronic and Information Engineering and State Key Laboratory for Mechanical Behaviour of Materials, Xi'an Jiaotong University, Xi'an 710049 (China)
  • 4. Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons, Jülich-Aachen Research Alliance (JARA), Forschungszentrum Jülich GmbH, 52425 Jülich, (Germany)

Description

Highlights: • First time resolution of 57 pm atom separations by HRTEM with 200 keV electrons. • Quantification of the image spread by absolute matching of experiment and simulation. • An information limit of 52 pm is deduced from the determined image spread. • Substantial deviations from the bulk structure are observed for the ultra-thin sample. - Abstract: The application of combined chromatic and spherical aberration correction in high-resolution transmission electron microscopy enables a significant improvement of the spatial resolution down to 50 pm. We demonstrate that such a resolution can be achieved in practice at 200 kV. Diffractograms of images of gold nanoparticles on amorphous carbon demonstrate corresponding information transfer. The Y atom pairs in [010] oriented yttrium orthoaluminate are successfully imaged together with the Al and the O atoms. Although the 57 pm pair separation is well demonstrated separations between 55 pm and 80 pm are measured. This observation is tentatively attributed to structural relaxations and surface reconstruction in the very thin samples used. Quantification of the resolution limiting effective image spread is achieved based on an absolute match between experimental and simulated image intensity distributions.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.ultramic.2016.12.026

Additional details

Identifiers

DOI
10.1016/j.ultramic.2016.12.026;
PII
S0304-3991(17)30047-5;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
176
Journal Page Range
p. 99-104
ISSN
0304-3991
CODEN
ULTRD6

Conference

Title
4. conference on frontiers of aberration corrected electron microscopy
Acronym
PICO 2017
Dates
30 Apr - 4 May 2017
Place
Kasteel Vaalsbroek (Netherlands)

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.