Published January 28, 2014 | Version v1
Journal article

Growth mechanism of Cobalt(II) Phthalocyanine(CoPc) thin films on SiO2 and muscovite substrates

  • 1. Department of Physics, Indian Institute of Technology Guwahati, Guwahati-781039 (India)
  • 2. Centre for Nano Technology, Indian Institute of Technology Guwahati, Guwahati-781039 (India)
  • 3. Department of Physics, Indian Institute of Technology Guwahati, Guwahati-781039 and Centre for Nano Technology, Indian Institute of Technology Guwahati, Guwahati-781039 (India)

Description

Thin films of Cobalt(II) Phthalocyanine (CoPc) were grown by thermal evaporation technique on two different substrates namely SiO2 and atomically cleaned muscovite mica(001) at various substrate temperatures. Deposition rate has been maintained to 0.3Å/sec during the growth of the films. The growth process is studied by means of atomic force microscopy (AFM). Films on SiO2 exhibit only three-dimensional islands and uniformity of these islands improved with substrate temperatures, whereas films on mica (001) consist of long oriented percolated structures. The results revealed that the growth mechanism of CoPc strongly depends on substrate temperatures as well as nature of substrate used. Optical properties were characterized by UV-Visible spectroscopy and structural properties were studied using X-ray diffraction

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
1576
Journal Issue
1
Journal Page Range
p. 152-154
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
2. international conference on optoelectronic materials and thin films for advanced technology
Acronym
OMTAT 2013
Dates
3-5 Jan 2013
Place
Kochi, Kerala (India)

Optional Information

Notes
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