Electrical and microstructural properties of microwave sintered SnO2-based varistors
Creators
- 1. IFMA-DAQ- PPGEM, S. Luis, MA (Brazil)
- 2. CMDMC, LIEC, Instituto de Quimica, UNESP, Araraquara, SP (Brazil)
- 3. DEMAT, Universidade Federal do Rio Grande do Sul - UFRGS, Porto Alegre, RS (Brazil)
Description
An investigation was made of the microstructural and electrical properties of SnO2 -based varistors microwave sintered at 1200 deg C, applying a heating rate of 120 deg C/min and treatment times of 10, 20, 30, 40, 50 and 60 min. The system used in this study was (98.95-X)%SnO2.1.0%CoO.0.05%Cr2O3.X%Ta2O5, where X corresponds to 0.05 and 0.065 mol%. Sintering was carried out in a domestic microwave oven (2.45 GHz) fitted for lab use. Silicon carbide was placed in a refractory vessel to form a heating chamber surrounding the sample holder. The pellets were examined by scanning electron microscopy, X-ray diffractometry, direct current measurements and impedance spectroscopy. The parameters of density, medium grain size, coefficient of nonlinearity, breakdown electrical field, leakage current, and height and width of the potential barrier were analyzed. (author)
Availability note (English)
Available from http://www.scielo.br/pdf/ce/v58n346/v58n346a04.pdfAdditional details
Identifiers
Publishing Information
- Journal Title
- Ceramica
- Journal Volume
- 58
- Journal Issue
- 346
- Journal Page Range
- p. 151-157
- ISSN
- 0366-6913
- CODEN
- CMCAAG
INIS
- Country of Publication
- Brazil
- Country of Input or Organization
- Brazil
- INIS RN
- 44060792
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- BREAKDOWN; CHROMIUM OXIDES; DENSITY; DIRECT CURRENT; ELECTRIC FIELDS; ELECTRICAL PROPERTIES; GHZ RANGE; HEIGHT; LEAKAGE CURRENT; MICROWAVE RADIATION; NONLINEAR PROBLEMS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR RESISTORS; SILICON CARBIDES; SINTERING; SPECTROSCOPY; TANTALUM OXIDES; TIN OXIDES; WIDTH; X-RAY DIFFRACTION
- Descriptors DEC
- CARBIDES; CARBON COMPOUNDS; CHALCOGENIDES; CHROMIUM COMPOUNDS; COHERENT SCATTERING; CURRENTS; DIFFRACTION; DIMENSIONS; ELECTRIC CURRENTS; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; EQUIPMENT; FABRICATION; FREQUENCY RANGE; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; REFRACTORY METAL COMPOUNDS; RESISTORS; SCATTERING; SEMICONDUCTOR DEVICES; SILICON COMPOUNDS; TANTALUM COMPOUNDS; TIN COMPOUNDS; TRANSITION ELEMENT COMPOUNDS