Published 2003 | Version v1
Journal article

Solid ion source based on hollow-cylindrical magnetron sputtering discharge

  • 1. Kharkov National University, Kharkov (Ukraine)
  • 2. Max-Plank Institut fur Plasmaphysik, Garching (Germany)
  • 3. Institute of Plasma Physics, NSC 'Kharkov Institute of Physics and Technology', Kharkov (Ukraine)

Description

A new solid ion source is described. The ion source based on hollow-cylindrical magnetron sputtering discharge produces the beam of various solid ions (B, C, Si, Ti, V, Fe, Ni, Ta, W) which are then extracted by an ion optical accelerating system. In this ion source DC discharge is used for generation of the ions of different metals and capacitively coupled RF discharge with a frequency 13.56 MHz is used for generation of the ions of other solid materials

Additional details

Publishing Information

Journal Title
Problems of Atomic Science and Technology. Series: Plasma Physics
Journal Issue
no.1/9/
Journal Page Range
p. 125-127
ISSN
1682-9344