Published April 1, 2011 | Version v1
Journal article

Design of numerical algorithms for the problem of charge transport in a 2D silicon MOSFET transistor with a silicon oxide nanochannel

  • 1. Sobolev Institute of Mathematics and Novosibirsk State University, Novosibirsk, 630090 (Russian Federation)
  • 2. Novosibirsk State University, Novosibirsk, 630090 (Russian Federation)

Description

We are concerned with the problem of charge transport in a 2D silicon MOSFET transistor occupying a domain Ω with a silicon oxide nanochannel occupying a domain ΩG. After proposing an additional boundary condition for the electric potential on the common boundary of the domains Ω and ΩG we design two numerical algorithms for funding approximate solutions of this problem. The first algorithm is a new one and uses interpolation polynomials of spline-collocation and the sweep method. The second algorithm is based on the well-known longitudinal-transverse sweep (l.t.s.) method. By using these algorithms we obtain graphs of stationary solutions of our problem. We also compare the workability and efficiency of the proposed algorithms for various values of parameters.

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/291/1/012016

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
291
Journal Issue
1
Journal Page Range
[17 p.]
ISSN
1742-6596

Conference

Title
3. nanotechnology international forum
Dates
1-3 Nov 2010
Place
Moscow (Russian Federation)