Published May 2003
| Version v1
Journal article
Influence of residual Ar+ in Ar cluster ion beam for DLC film formation
Description
In order to study the influences of residual Ar monomer ion (Ar+) on sp2 content and hardness of diamond like carbon (DLC) films formed by Ar cluster ion beam assisted deposition, Ar cluster ion, Ar+ and their mixed ions (Ar cluster ion and Ar+) bombardments were performed during evaporation of C60. From near edge X-ray absorption fine structure (NEXAFS) and Raman spectroscopy measurements, lower sp2 content in the carbon films was obtained with Ar cluster ion bombardment than that with Ar+ and mixed ion. Furthermore higher hardness and smooth surface were shown with Ar cluster ion bombardments. Therefore it was important to reduce Ar+ in Ar cluster ion beams to obtain hard DLC films with flat surface
Additional details
Identifiers
- PII
- S0168583X03008899;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 206
- Journal Issue
- 1-4
- Journal Page Range
- p. 884-888
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 13. international conference on ion beam modification of materials
- Dates
- 1-6 Sep 2002
- Place
- Kobe (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Egypt
- INIS RN
- 35049578
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABSORPTION SPECTRA; ANTIMONY IONS; ARGON; ARGON IONS; DEPOSITION; DIAMONDS; EVAPORATION; FILMS; FINE STRUCTURE; HARDNESS; ION BEAMS; ION PAIRS; MONOMERS; RAMAN SPECTROSCOPY; ROUGHNESS; X-RAY SPECTRA
- Descriptors DEC
- BEAMS; CARBON; CHARGED PARTICLES; ELEMENTS; FLUIDS; GASES; IONS; LASER SPECTROSCOPY; MECHANICAL PROPERTIES; MINERALS; NONMETALS; PHASE TRANSFORMATIONS; RARE GASES; SPECTRA; SPECTROSCOPY; SURFACE PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.