Published January 4, 1999 | Version v1
Journal article

Refracted X-rays propagating near the surface under grazing incidence condition

  • 1. Department of Materials Science and Engineering, Kyoto University, Yoshida-honnmachi, Sakyo-ku, Kyoto (Japan)
  • 2. Department of Electronic Science and Engineering, Kyoto University, Yoshida-honnmachi, Sakyo-ku, Kyoto (Japan)

Description

X-ray refractions through a silicon wafer and an organic thin film, n-C33H68/Si, were measured using white incident X-rays under a grazing incidence condition. The energy variation of a refracted X-ray beam by a silicon wafer was well explained by the simple Snell's law when the position of the detector (solid-state detector) was changed. On the other hand, two refracted X-ray beams were observed from the organic thin film. The energy variation of one beam which propagated through the silicon substrate followed Snell's law, while that of another beam did not and changed little when the detector position was varied. (Copyright (c) 1999 Elsevier Science B.V., Amsterdam. All rights reserved.)

Additional details

Publishing Information

Journal Title
Spectrochimica Acta. Part B, Atomic Spectroscopy
Journal Volume
54
Journal Issue
1
Journal Page Range
p. 227-230
ISSN
0584-8547
CODEN
SAASBH

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43122458
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Descriptors DEI
RADIATION SCATTERING ANALYSIS; REFRACTION; REFRACTIVE INDEX; SILICON; THIN FILMS; X-RAY SPECTRA; X-RAY SPECTROSCOPY
Descriptors DEC
CHEMICAL ANALYSIS; ELEMENTS; FILMS; NONDESTRUCTIVE ANALYSIS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; SEMIMETALS; SPECTRA; SPECTROSCOPY

Optional Information

Notes
This record replaces 31061926