Published January 4, 1999
| Version v1
Journal article
Refracted X-rays propagating near the surface under grazing incidence condition
- 1. Department of Materials Science and Engineering, Kyoto University, Yoshida-honnmachi, Sakyo-ku, Kyoto (Japan)
- 2. Department of Electronic Science and Engineering, Kyoto University, Yoshida-honnmachi, Sakyo-ku, Kyoto (Japan)
Description
X-ray refractions through a silicon wafer and an organic thin film, n-C33H68/Si, were measured using white incident X-rays under a grazing incidence condition. The energy variation of a refracted X-ray beam by a silicon wafer was well explained by the simple Snell's law when the position of the detector (solid-state detector) was changed. On the other hand, two refracted X-ray beams were observed from the organic thin film. The energy variation of one beam which propagated through the silicon substrate followed Snell's law, while that of another beam did not and changed little when the detector position was varied. (Copyright (c) 1999 Elsevier Science B.V., Amsterdam. All rights reserved.)
Additional details
Publishing Information
- Journal Title
- Spectrochimica Acta. Part B, Atomic Spectroscopy
- Journal Volume
- 54
- Journal Issue
- 1
- Journal Page Range
- p. 227-230
- ISSN
- 0584-8547
- CODEN
- SAASBH
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43122458
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- RADIATION SCATTERING ANALYSIS; REFRACTION; REFRACTIVE INDEX; SILICON; THIN FILMS; X-RAY SPECTRA; X-RAY SPECTROSCOPY
- Descriptors DEC
- CHEMICAL ANALYSIS; ELEMENTS; FILMS; NONDESTRUCTIVE ANALYSIS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; SEMIMETALS; SPECTRA; SPECTROSCOPY
Optional Information
- Notes
- This record replaces 31061926