Published August 2005 | Version v1
Journal article

Determination of nitrogen-related defects in N-implanted ZnO films by dynamic cathodoluminescence

  • 1. Department of Physics and Materials Science, City University of Hong Kong, Kowloon, Hong Kong (China)
  • 2. Department of Physics, Chinese University of Hong Kong, Shatin, Hong Kong (China)

Description

Visible bands arising from N-related defects are investigated by dynamic cathodoluminescence (CL) and Gaussian deconvolution. The intensity of the red band increases while that of the ultraviolet (UV) band decreases. The intensity of the yellow band also decreases but only slightly as a function of the electron bombardment cycle. The CL behavior of N-doped ZnO after post-annealing in N2 at high temperature reveals that the N-related defects cannot be easily compensated. The results also confirm the assignment of the N-related defects and are in agreement with the theoretical prediction about Zn-N bonding. Our data provide some clues to the mechanism of the conversion of ZnO into p-type by nitrogen doping

Additional details

Identifiers

DOI
10.1016/j.nimb.2005.05.005;
PII
S0168-583X(05)00726-3;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
237
Journal Issue
1-2
Journal Page Range
p. 307-311
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
15. international conference on ion implantation technology
Dates
25-27 Oct 2004
Place
Taipei, Taiwan (China)

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.