Published February 3, 2014 | Version v1
Journal article

High performance vertical tunneling diodes using graphene/hexagonal boron nitride/graphene hetero-structure

  • 1. Department of Nano Science and Technology, SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 440-746 (Korea, Republic of)
  • 2. Samsung-SKKU Graphene Center (SSGC), Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 440-746 (Korea, Republic of)
  • 3. Center for Human Interface Nano Technology (HINT), Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 440-746 (Korea, Republic of)
  • 4. Frontier Research Laboratory, Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., Yongin, Gyeonggi-do 446-711 (Korea, Republic of)
  • 5. Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543 (Singapore)
  • 6. Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore)

Description

A tunneling rectifier prepared from vertically stacked two-dimensional (2D) materials composed of chemically doped graphene electrodes and hexagonal boron nitride (h-BN) tunneling barrier was demonstrated. The asymmetric chemical doping to graphene with linear dispersion property induces rectifying behavior effectively, by facilitating Fowler-Nordheim tunneling at high forward biases. It results in excellent diode performances of a hetero-structured graphene/h-BN/graphene tunneling diode, with an asymmetric factor exceeding 1000, a nonlinearity of ∼40, and a peak sensitivity of ∼12 V−1, which are superior to contending metal-insulator-metal diodes, showing great potential for future flexible and transparent electronic devices

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
104
Journal Issue
5
Journal Page Range
p. 053103-053103.4
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
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