Published July 2019
| Version v1
Journal article
Energy Threshold of the Atomic and Cluster Sputtering of Some Elements under Bombardment with Cs, Rb, and Na Ions
- 1. Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences (Uzbekistan)
Description
Abstract—
The results obtained using secondary-ion mass spectrometry under the bombardment of Si(111) crystals are analyzed. It is shown that, as bombarding ion masses are increased in the case of the same energy, the relative yield of cluster ions and the threshold cluster sputtering energy increase with increasing number n; n is the number of atoms in the cluster (n = 1–5). The threshold sputtering energies are determined for atoms and clusters. The experimental data on the threshold particle sputtering energies are compared with the data of molecular-dynamics simulation.Additional details
Identifiers
Publishing Information
- Journal Title
- Surface Investigation: X-ray, Synchrotron and Neutron Techniques
- Journal Volume
- 13
- Journal Issue
- 4
- Journal Page Range
- p. 640-643
- ISSN
- 1027-4510
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54112567
- Subject category
- S36: MATERIALS SCIENCE; S74: ATOMIC AND MOLECULAR PHYSICS;
- Descriptors DEI
- ANIONS; ATOMS; COMPUTERIZED SIMULATION; CRYSTALS; ION PAIRS; MASS SPECTROSCOPY; MOLECULAR DYNAMICS METHOD; SODIUM IONS; SPUTTERING
- Descriptors DEC
- CALCULATION METHODS; CHARGED PARTICLES; IONS; SIMULATION; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2019 Pleiades Publishing, Ltd.