Published July 2019 | Version v1
Journal article

Energy Threshold of the Atomic and Cluster Sputtering of Some Elements under Bombardment with Cs, Rb, and Na Ions

  • 1. Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences (Uzbekistan)

Description

Abstract

The results obtained using secondary-ion mass spectrometry under the bombardment of Si(111) crystals are analyzed. It is shown that, as bombarding ion masses are increased in the case of the same energy, the relative yield of cluster ions and the threshold cluster sputtering energy increase with increasing number n; n is the number of atoms in the cluster (n = 1–5). The threshold sputtering energies are determined for atoms and clusters. The experimental data on the threshold particle sputtering energies are compared with the data of molecular-dynamics simulation.

Additional details

Identifiers

Publishing Information

Journal Title
Surface Investigation: X-ray, Synchrotron and Neutron Techniques
Journal Volume
13
Journal Issue
4
Journal Page Range
p. 640-643
ISSN
1027-4510

INIS

Country of Publication
Russian Federation
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
54112567
Subject category
S36: MATERIALS SCIENCE; S74: ATOMIC AND MOLECULAR PHYSICS;
Descriptors DEI
ANIONS; ATOMS; COMPUTERIZED SIMULATION; CRYSTALS; ION PAIRS; MASS SPECTROSCOPY; MOLECULAR DYNAMICS METHOD; SODIUM IONS; SPUTTERING
Descriptors DEC
CALCULATION METHODS; CHARGED PARTICLES; IONS; SIMULATION; SPECTROSCOPY

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Copyright (c) 2019 Pleiades Publishing, Ltd.