Effects of ion bombardment on chemical interactions at SiC surface and Al/SiC interfaces
Creators
- 1. Univ. of Washington, Seattle, WA (United States). Dept. of Materials Science and Engineering
Description
An investigation into the SiC surface and its interaction with aluminum, in particular, focusing on the effect of ion bombardment and adsorption of oxygen, is described. Stoichiometric and carbon rich and SiC surfaces were produced and analyzed in situ by Auger electron spectroscopy and x-ray photoelectron spectroscopy. Cubic SiC shows preferential sputtering under Ar ion bombardment, leading to carbon rich surface, whereas high temperature annealing also causes carbon rich surface. Activity of these surfaces was compared with oxygen and aluminum adsorption. Stoichiometrically sputtered surface showed vastly increased oxygen affinity, whereas carbon-rich sputtered surfaces did not. Aluminum deposition caused significant Al-C interaction for the stoichiometric ion-bombarded surface. Aluminum carbide was induced catalytically upon heating in the presence of oxygen. Carbon-rich surfaces had, however, no significant interactions with as-deposited Al due to strong surface C-C bonds
Additional details
Publishing Information
- Publisher
- Materials Research Society.
- Imprint Place
- Pittsburgh, PA (United States)
- ISBN
- 1-55899-342-8
- Imprint Title
- Materials modification and synthesis by ion beam processing
- Imprint Pagination
- 748 p.
- Series
- Materials Research Society symposium proceedings, Volume 438.
- Journal Page Range
- p. 253-258.
Conference
- Title
- 1996 Fall meeting of the Materials Research Society (MRS).
- Dates
- 2-6 Dec 1996.
- Place
- Boston, MA (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 29012635
- Subject category
- S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference, Numerical Data
- Descriptors DEI
- ALUMINIUM ALLOYS; BONDING; COMPOSITE MATERIALS; EXPERIMENTAL DATA; INTERFACES; OXYGEN; RADIATION EFFECTS; SILICON CARBIDES
- Descriptors DEC
- ALLOYS; CARBIDES; CARBON COMPOUNDS; DATA; ELEMENTS; FABRICATION; INFORMATION; JOINING; MATERIALS; NONMETALS; NUMERICAL DATA; SILICON COMPOUNDS
Optional Information
- Secondary number(s)
- CONF-961202--.