Published June 2004
| Version v1
Journal article
Depth characterization of nm-layers by low energy ion scattering
Description
Layers with a thickness in the nm range are of growing importance in science and technology. We describe, how the thickness and growth modes of such nm-layers can be characterized by time-of-flight low energy ion scattering (TOF-LEIS), when all backscattered projectiles are taken into account. As examples, Cu evaporated on an Al2O3 and on a PET target with a nominal film thickness of about 1nm are analyzed by means of TOF-LEIS using H and He ions in the keV range as projectiles
Additional details
Identifiers
- DOI
- 10.1016/j.nimb.2004.01.123;
- PII
- S0168583X0400151X;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 219-220
- Journal Issue
- 4
- Journal Page Range
- p. 578-583
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 16. international conference on ion beam analysis
- Dates
- 29 Jun - 4 Jul 2003
- Place
- Albuquerque, NM (United States)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Brazil
- INIS RN
- 35105691
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALUMINIUM OXIDES; COPPER; DEPTH; ENERGY SPECTRA; HELIUM IONS; HYDROGEN IONS; ION BEAMS; ION SCATTERING ANALYSIS; NANOSTRUCTURES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THICKNESS; THIN FILMS; TIME-OF-FLIGHT METHOD
- Descriptors DEC
- ALUMINIUM COMPOUNDS; BEAMS; CHALCOGENIDES; CHARGED PARTICLES; CHEMICAL ANALYSIS; DIMENSIONS; ELEMENTS; FILMS; IONS; METALS; NONDESTRUCTIVE ANALYSIS; OXIDES; OXYGEN COMPOUNDS; SPECTRA; SPECTROSCOPY; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.