Published March 2009
| Version v1
Journal article
Room-temperature ferromagnetism in Er-doped ZnO thin films
- 1. Key Laboratory for Magnetism and Magnetic Materials of MOE, Lanzhou University, No.222, South Tianshui Road, Lanzhou 730000 (China)
Description
Zn1-xErxO thin films have been fabricated on glass substrates by radiofrequency reactive magnetron sputtering. All the films were ferromagnetic at room temperature except for x = 0 and the estimated magnetic moment per Er ion decreased with increasing Er concentration. The presence of any secondary phase was ruled out based on X-ray diffraction and X-ray photoelectron spectroscopy. The ferromagnetism was attributed to the substitution of Er ions for Zn2+ in ZnO lattices, and could be interpreted by the bound-magnetic-polaron model
Availability note (English)
Available from http://dx.doi.org/10.1016/j.scriptamat.2008.10.015Additional details
Identifiers
- DOI
- 10.1016/j.scriptamat.2008.10.015;
- PII
- S1359-6462(08)00735-5;
Publishing Information
- Journal Title
- Scripta Materialia
- Journal Volume
- 60
- Journal Issue
- 5
- Journal Page Range
- p. 289-292
- ISSN
- 1359-6462
- CODEN
- SCMAF7
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40077594
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DOPED MATERIALS; ERBIUM IONS; FERROMAGNETISM; GLASS; MAGNETIC MOMENTS; MAGNETRONS; RADIOWAVE RADIATION; RAMAN SPECTROSCOPY; SEMICONDUCTOR MATERIALS; SPUTTERING; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY; ZINC IONS; ZINC OXIDES
- Descriptors DEC
- CHALCOGENIDES; CHARGED PARTICLES; COHERENT SCATTERING; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; FILMS; IONS; LASER SPECTROSCOPY; MAGNETISM; MATERIALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; SCATTERING; SPECTROSCOPY; TEMPERATURE RANGE; ZINC COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.