On the propagation of a low energy oxygen ion beam

Positive ion beams, in the range from about tens eV to several hundred eV are frequently used in RIE and RIBE etching systems. The experimental limitations in this energy range are severe and there are still many unsolved problems. Optimal ion beam focusing and maximum current beam at the substrate target are assured by the adequate ion beam neutralization. The electrons from the target plasma and also the secondary ones resulted from the ion-grid and ion-neutral interactions form a negative space charge that is involved in the ion beam neutralization. After the extraction, both the angular divergence and damping of the beam are essential to settle the position of the substrate. The beam angular divergence is established by the ion trajectories in the extraction region and also is strongly influenced by the ion beam neutralization. The shape and thickness of the space charge near the grid, which in turn is determined by the beam intensity, grid characteristics and target plasma parameters is necessary to be investigated. Positive ion bombardment plays an important role in the plasma treatments of polymers. This was the reason that investigations about the surface modifications of polymers in a positive oxygen ion beam-low density plasma (IB-LDP) system were carried out by our group [2-6]. In such system the electrons of the low-density target plasma neutralize the positive space charge of the beam and also that brought by the beam onto the polymer (insulator) surface. Results concerning the investigations of the IB-LDP system, in oxygen, by Langmuir probe method, in different experimental conditions are given in the present paper. They are compared with those obtained by using Monte Carlo method for elementary processes (ion charge transfer, electronic ionisation) in 'particle in cell' numerical simulation. (authors)