Published January 1, 2008
| Version v1
Journal article
In Situ Synchrotron Studies of ZnO Nanostructures During Electrochemical Deposition
Description
ZnO nanostructured films fabricated by electrochemical deposition exhibit a variety of morphologies. Understanding their respective nucleation and growth mechanisms requires in situ techniques. A time-resolved X-ray absorption and fluorescence method is described, which adequately captures both processes and illustrates differences in the growth rates for films deposited at different potentials. In so doing, the new method has significant advantages over a previous method of continually scanning across the near-edge region of the absorption spectrum while the film was being deposited.
Additional details
Identifiers
Publishing Information
- Journal Title
- Current Applied Physics
- Journal Volume
- 8
- Journal Issue
- 39876
- Journal Page Range
- p. 455-458
- ISSN
- 1567-1739
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 41108354
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ABSORPTION; DEPOSITION; FILMS; FLUORESCENCE; NANOSTRUCTURES; NUCLEATION; SYNCHROTRONS; ZINC OXIDES
- Descriptors DEC
- ACCELERATORS; CHALCOGENIDES; CYCLIC ACCELERATORS; EMISSION; LUMINESCENCE; OXIDES; OXYGEN COMPOUNDS; PHOTON EMISSION; SORPTION; ZINC COMPOUNDS
Optional Information
- Contract/Grant/Project number
- AC02-98CH10886
- Notes
- doi 10.1016/j.cap.2007.10.038
- Funding organization
- Doe - Office Of Science (United States)
- Secondary number(s)
- BNL--83150-2009-JA