Published October 1, 1990 | Version v1
Journal article

Submicron structuring of YBa2Cu3O7 thin films with electron beam lithography

  • 1. Institute of Semiconductor Electronics, RWTH-Aachen, Sommerfeldstr. (Federal Republic of Germany)
  • 2. IFF, KFA-Julich (Federal Republic of Germany)

Description

Thin films of high-temperature superconducting YBaCuO deposited by dc-sputtering on SrTiO3 substrates are structured by electron beam lithography on a submicron scale. Details of the technology processes involved are presented. The sudden transition of structures below 1 μm into the semiconducting state is discussed

Additional details

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
68
Journal Issue
7
Series
J. Appl. Phys.
Journal Page Range
3778-3779
ISSN
0021-8979
CODEN
JAPIA