Size control of nanopores formed on SiO2 glass by swift-heavy-ion irradiation and its application to highly sensitive biomolecular detection
- 1. Tandem Accelerator Complex, Research Facility Center for Science and Technology, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8577 (Japan)
- 2. Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562 (Japan)
Description
Swift-heavy-ion irradiation creates latent tracks in SiO2 glass and nanopores with a high aspect ratio can be formed along these ion paths by selective etching of the latent tracks using hydrogen fluoride (HF) vapor. Here we report that the size of nanopores can easily be controlled by simply changing the temperature of the HF solution generating the vapor and/or that of the SiO2 glass exposed to the vapor. Furthermore, this method of size control was used to produce SiO2 glass sheets with nanopores of different sizes and number densities for use as the waveguide layer in the sensing plates for a waveguide-mode sensor. In comparison with nonperforated plates, the increased surface area due to the formation of nanopores was found to create up to a tenfold increase in sensitivity.
Additional details
Identifiers
- DOI
- 10.1116/1.3609795;
Publishing Information
- Journal Title
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
- Journal Volume
- 29
- Journal Issue
- 5
- Journal Page Range
- p. 051402-051402.6
- ISSN
- 1553-1813
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44014077
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ASPECT RATIO; DENSITY; ETCHING; GLASS; HEAVY IONS; HYDROGEN FLUORIDES; ION BEAMS; NANOSTRUCTURES; PARTICLE TRACKS; PLATES; SENSITIVITY; SILICON OXIDES; SURFACE AREA; VAPORS; WAVEGUIDES
- Descriptors DEC
- BEAMS; CHALCOGENIDES; CHARGED PARTICLES; DIMENSIONLESS NUMBERS; FLUIDS; FLUORIDES; FLUORINE COMPOUNDS; GASES; HALIDES; HALOGEN COMPOUNDS; HYDROGEN COMPOUNDS; HYDROGEN HALIDES; IONS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SILICON COMPOUNDS; SURFACE FINISHING; SURFACE PROPERTIES
Optional Information
- Notes
- (c) 2011 American Vacuum Society