Published April 2004 | Version v1
Journal article

Ion density distribution in an inductively coupled plasma chamber

  • 1. South China Normal University, Guangzhou (China). School of Physics and Telecommunications Engineering

Description

The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa, 27 Pa and 53 Pa in the reaction chamber, different radio-frequency powers and different positions. The result indicates that the ion density decreases as the pressure increases, and increases as the power decreases. The ion density of axial position z=0 achieves 5.8 x 1010 on the center of coil under the power of 200 w and pressure of 9 Pa in the reaction chamber. (author)

Additional details

Publishing Information

Journal Title
Plasma Science and Technology
Journal Volume
6
Journal Issue
2
Journal Page Range
p. 2233-2236
ISSN
1009-0630

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
36114571
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
DISTRIBUTION; ION DENSITY; LANGMUIR PROBE; PLASMA DIAGNOSTICS; PRESSURE DEPENDENCE; RADIOWAVE RADIATION; RF SYSTEMS
Descriptors DEC
ELECTRIC PROBES; ELECTROMAGNETIC RADIATION; PROBES; RADIATIONS

Optional Information

Notes
5 figs., 7 refs.