Published April 2004
| Version v1
Journal article
Ion density distribution in an inductively coupled plasma chamber
- 1. South China Normal University, Guangzhou (China). School of Physics and Telecommunications Engineering
Description
The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa, 27 Pa and 53 Pa in the reaction chamber, different radio-frequency powers and different positions. The result indicates that the ion density decreases as the pressure increases, and increases as the power decreases. The ion density of axial position z=0 achieves 5.8 x 1010 on the center of coil under the power of 200 w and pressure of 9 Pa in the reaction chamber. (author)
Additional details
Publishing Information
- Journal Title
- Plasma Science and Technology
- Journal Volume
- 6
- Journal Issue
- 2
- Journal Page Range
- p. 2233-2236
- ISSN
- 1009-0630
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 36114571
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- DISTRIBUTION; ION DENSITY; LANGMUIR PROBE; PLASMA DIAGNOSTICS; PRESSURE DEPENDENCE; RADIOWAVE RADIATION; RF SYSTEMS
- Descriptors DEC
- ELECTRIC PROBES; ELECTROMAGNETIC RADIATION; PROBES; RADIATIONS
Optional Information
- Notes
- 5 figs., 7 refs.