Published December 2006 | Version v1
Journal article

Polarized IR studies of silica glasses exposed to polarized excimer radiation

  • 1. Science and Technology Division, Corning, Inc., Corning, New York 14830 (United States)

Description

Silica glass exhibits a permanent anisotropic response, polarization-induced birefringence (PIB), when exposed to short-wavelength polarized light. This behavior has been correlated with the OH content of the glass. In this paper we describe polarized infrared studies of silica glasses of different OH content exposed with polarized 157 nm laser light. Changes in the fundamental OH band as a consequence of exposure are shown. We find differential bleaching of a particular OH band where OH species that are oriented parallel to the incident exposing polarization undergo greater bleaching than those oriented perpendicular. The preferential bleaching as a function of exposure time correlates strongly with the evolution of PIB, leading to a bleaching model of OH that is causally linked to PIB

Additional details

Identifiers

Publishing Information

Journal Title
Journal of the Optical Society of America. Part B, Optical Physics
Journal Volume
23
Journal Issue
12
Journal Page Range
p. 2511-2517
ISSN
0740-3224
CODEN
JOBPDE

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38024399
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S36: MATERIALS SCIENCE;
Descriptors DEI
ABSORPTION; ANISOTROPY; BIREFRINGENCE; BLEACHING; GLASS; LASERS; POLARIZATION; SILICA; VISIBLE RADIATION; WAVELENGTHS
Descriptors DEC
ELECTROMAGNETIC RADIATION; MINERALS; OXIDE MINERALS; RADIATIONS; REFRACTION; SORPTION

Optional Information

Notes
(c) 2006 Optical Society of America