Published November 14, 2015 | Version v1
Journal article

Fermi level pinning at the Ge(001) surface—A case for non-standard explanation

  • 1. Center for Nanometer-Scale Science and Advanced Materials (NANOSAM), Faculty of Physics, Astronomy and Applied Computer Science, Jagiellonian University, ul. St. Lojasiewicza 11, 30-348 Krakow (Poland)

Description

To explore the origin of the Fermi level pinning in germanium, we investigate the Ge(001) and Ge(001):H surfaces. The absence of relevant surface states in the case of Ge(001):H should unpin the surface Fermi level. This is not observed. For samples with donors as majority dopants, the surface Fermi level appears close to the top of the valence band regardless of the surface structure. Surprisingly, for the passivated surface, it is located below the top of the valence band allowing scanning tunneling microscopy imaging within the band gap. We argue that the well known electronic mechanism behind band bending does not apply and a more complicated scenario involving ionic degrees of freedom is therefore necessary. Experimental techniques involve four point probe electric current measurements, scanning tunneling microscopy, and spectroscopy

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
118
Journal Issue
18
Journal Page Range
p. 185703-185703.5
ISSN
0021-8979
CODEN
JAPIAU

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47063065
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
DEGREES OF FREEDOM; DOPED MATERIALS; ELECTRIC CURRENTS; FERMI LEVEL; GERMANIUM; ORIGIN; SCANNING TUNNELING MICROSCOPY; SPECTROSCOPY; SURFACES; VALENCE
Descriptors DEC
CURRENTS; ELEMENTS; ENERGY LEVELS; MATERIALS; METALS; MICROSCOPY

Optional Information

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