Published October 1974
| Version v1
Journal article
On interaction of CH3-radicals with thin tellurium films
Creators
- 1. Nauchno-Issledovatel'skij Fiziko-Khimicheskij Inst., Moscow (USSR)
Description
no abstract available
Additional details
Additional titles
- Original title (Russian)
- О взаимодействии CH
Publishing Information
- Journal Title
- Zh. Fiz. Khim.
- Journal Volume
- 48
- Journal Issue
- 10
- Series
- Zh. Fiz. Khim.
- Journal Page Range
- 2589-2590
INIS
- Country of Publication
- USSR
- Country of Input or Organization
- USSR
- INIS RN
- 6182051
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- ALKYL RADICALS; CHEMISORPTION; DESORPTION; ELECTRIC CONDUCTIVITY; FILMS; TELLURIUM
- Descriptors DEC
- CHEMICAL REACTIONS; ELECTRICAL PROPERTIES; ELEMENTS; PHYSICAL PROPERTIES; RADICALS; SEMIMETALS; SEPARATION PROCESSES
Optional Information
- Notes
- Published in summary form only; for English translation see the journal Russ. J. Phys. Chem.