Pulsed laser deposition of indium tin oxide films on flexible polyethylene naphthalate display substrates at room temperature
- 1. University of Birmingham, School of Engineering, Department of Metallurgy and Materials, Edgbaston, Birmingham, B15 2TT (United Kingdom)
- 2. West Virginia University, College of Engineering and Mineral Resources, Department of Mechanical and Aerospace Engineering, Morgantown, West Virginia, 26506 (United States)
Description
Pulsed laser deposition was used to deposit high-quality indium tin oxide (ITO) thin solid films on polyethylene napthalate (PEN) flexible display substrates. The electrical, optical, microstructural, mechanical and adhesive properties of the functional thin layer were investigated as a function of a narrow range of background oxygen gas pressure at room temperature, which is the most desirable thermal condition for growing transparent conducting oxides on flexible display polymer substrates. ITO films (240 ± 35 nm thick) deposited on PEN at room temperature in the range of 0.33 to 2.66 Pa background oxygen pressure are observed to exhibit low electrical resistivity (∼ 10-4 Ω cm) and high optical transmission (∼ 90%). Electromechanical uniaxial tensile testing, of the hybrid thin structures, results in crack onset nominal strains of around 2%. The ITO surface adhesion reaches a maximum at 1.33 Pa deposition pressure.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2009.08.002Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2009.08.002;
- PII
- S0040-6090(09)01359-5;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 518
- Journal Issue
- 10
- Journal Page Range
- p. 2623-2627
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42054735
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ADHESION; ADHESIVES; CRACKS; ELECTRIC CONDUCTIVITY; ENERGY BEAM DEPOSITION; INDIUM OXIDES; LASER RADIATION; MICROSTRUCTURE; OXYGEN; POLYETHYLENES; PULSED IRRADIATION; STRAINS; SURFACES; TEMPERATURE RANGE 0273-0400 K; TESTING; THIN FILMS; TIN OXIDES
- Descriptors DEC
- CHALCOGENIDES; DEPOSITION; ELECTRICAL PROPERTIES; ELECTROMAGNETIC RADIATION; ELEMENTS; FILMS; INDIUM COMPOUNDS; IRRADIATION; NONMETALS; ORGANIC COMPOUNDS; ORGANIC POLYMERS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; POLYMERS; POLYOLEFINS; RADIATIONS; SURFACE COATING; TEMPERATURE RANGE; TIN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.