Control of surface quality of sub-millimeter cylindrical gold targets
Creators
- 1. Research Center of Laser Fusion, Mianyang (China)
- 2. School of Material Science and Engineering, Southwest University of Science and Technology, Mianyang (China)
- 3. School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu (China)
Description
The morphology, composition and causes of defects are analyzed to reduce defects on the gold layer prepared by electrochemical deposition from sulfite solution, and to improve the surface quality of sub-millimeter cylindrical gold targets, by means of SEM and EDS. The effects of current density, metallic impurity, organic pollution, pre-deposition parameters and mandrel quality on the quality of the gold plating are discussed, along with their mechanisms. The result indicates that the current density must be controlled strictly. The optimal current density ranges from 2.4 to 3.2 mA/cm2 when the concentration of gold ranges from 13 to 22 g/L, and from 2.0 to 2.6 mA/ cm2 when the concentration of gold ranges from 5 to 13 g/L. The parameters of predeposition must be optimized and the predeposition time should be no longer than 1 minute to improve the surface quality. In addition, organic pollution should be removed from the bath, and the mandrels should be of good quality without oxide on their surfaces. (authors)
Additional details
Publishing Information
- Journal Title
- High Power Laser and Particle Beams
- Journal Volume
- 22
- Journal Issue
- 11
- Journal Page Range
- p. 2608-2612
- ISSN
- 1001-4322
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 43075042
- Subject category
- S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ABUNDANCE; CURRENT DENSITY; CYLINDRICAL CONFIGURATION; DEFECTS; ELECTRODEPOSITION; GOLD; IMPURITIES; INERTIAL CONFINEMENT; LASER TARGETS; LAYERS; MATHEMATICAL SOLUTIONS; MORPHOLOGY; OXIDES; PLATING; POLLUTION; QUALITY CONTROL; SCANNING ELECTRON MICROSCOPY; SOLUTIONS; SULFITES; SURFACES
- Descriptors DEC
- CHALCOGENIDES; CONFIGURATION; CONFINEMENT; CONTROL; DEPOSITION; DISPERSIONS; ELECTROLYSIS; ELECTRON MICROSCOPY; ELEMENTS; HOMOGENEOUS MIXTURES; LYSIS; METALS; MICROSCOPY; MIXTURES; OXYGEN COMPOUNDS; PLASMA CONFINEMENT; SULFUR COMPOUNDS; SURFACE COATING; TARGETS; TRANSITION ELEMENTS
Optional Information
- Notes
- 9 figs., 1 tab., 8 refs.