Published September 30, 2006 | Version v1
Journal article

A New theory for evaluating the number density of inclusions in films

  • 1. Shanghai Institution of Optics and Fine Mechanics, Shanghai 201800 (China) and Graduate School, Chinese Academy of Sciences, Beijing 100080 (China)
  • 2. Shanghai Institution of Optics and Fine Mechanics, Shanghai 201800 (China)

Description

A new formulation derived from thermal characters of inclusions and host films for estimating laser induced damage threshold has been deduced. This formulation is applicable for dielectric films when they are irradiated by laser beam with pulse width longer than tens picoseconds. This formulation can interpret the relationship between pulse-width and damage threshold energy density of laser pulse obtained experimentally. Using this formulation, we can analyze which kind of inclusion is the most harmful inclusion. Combining it with fractal distribution of inclusions, we have obtained an equation which describes relationship between number density of inclusions and damage probability. Using this equation, according to damage probability and corresponding laser energy density, we can evaluate the number density and distribution in size dimension of the most harmful inclusions

Additional details

Identifiers

DOI
10.1016/j.apsusc.2005.10.042;
PII
S0169-4332(05)01513-8;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
252
Journal Issue
23
Journal Page Range
p. 8235-8238
ISSN
0169-4332
CODEN
ASUSEE

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38104306
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
DAMAGE; DIELECTRIC MATERIALS; ENERGY DENSITY; FILMS; INCLUSIONS; LASER RADIATION; PHYSICAL RADIATION EFFECTS; PULSED IRRADIATION; THRESHOLD ENERGY
Descriptors DEC
ELECTROMAGNETIC RADIATION; ENERGY; IRRADIATION; MATERIALS; RADIATION EFFECTS; RADIATIONS

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.