Published July 1, 2011 | Version v1
Journal article

Ultrasoft Finemet thin films for magneto-impedance microsensors

  • 1. IEF, UMR 8622, CNRS/University Paris Sud, F-91405 Orsay (France)
  • 2. LGEP, UMR 8507, CNRS/University Paris Sud/Supelec, F-91192 Gif-Sur-Yvette (France)
  • 3. SATIE, UMR 8029, CNRS/ENS Cachan, F-94235 Cachan (France)

Description

FeCuNbSiB thin films have been deposited using RF sputtering. Characterizations have shown that oxygen contamination and residual stress are mainly responsible for magnetic hardening. The sputtering and annealing conditions have been optimized and films with a coercive field as low as 10 A m−1 (0.125 Oe) have been achieved. In addition, the influence of film thickness on the magnetic properties has been studied. Thus, magnetic field microsensors based on the magneto-impedance effect have been fabricated by stacking up Finemet/copper/Finemet films. The highest sensitivity (4000 V/T/A) is reached for 750 nm thick films. This is in the same range as cm-sized macroscopic devices realized using 20 µm thick ribbons

Availability note (English)

Available from http://dx.doi.org/10.1088/0960-1317/21/7/074010

Additional details

Identifiers

DOI
10.1088/0960-1317/21/7/074010;
PII
S0960-1317(11)78960-4;

Publishing Information

Journal Title
Journal of Micromechanics and Microengineering. Structures, Devices and Systems
Journal Volume
21
Journal Issue
7
Journal Page Range
[8 p.]
ISSN
0960-1317
CODEN
JMMIEZ

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47010099
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ANNEALING; COPPER; DEPOSITS; HARDENING; IMPEDANCE; MAGNETIC FIELDS; MAGNETIC PROPERTIES; OXYGEN; RESIDUAL STRESSES; SENSITIVITY; SPUTTERING; THICKNESS; THIN FILMS
Descriptors DEC
DIMENSIONS; ELEMENTS; FILMS; HEAT TREATMENTS; METALS; NONMETALS; PHYSICAL PROPERTIES; STRESSES; TRANSITION ELEMENTS