Published January 2006 | Version v1
Journal article

Effect of ion beam implantation on density of DLC prepared by plasma-based ion implantation and deposition

  • 1. Graduate School of Engineering, University of Hyogo, Himeji (Japan)
  • 2. Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka (Japan)

Description

DLC (diamond-like carbon) films were prepared by the hybrid process of plasma-based ion implantation and deposition using acetylene plasma. The hydrogen content in DLC films decreased with the increase of negative pulsed voltage. The residual stress, density and hardness of DLC films had a peak at the negative pulsed voltage of 0 to -5 kV. At -5 to -20 kV, they had a correlation each other and considerably decreased with the increase of negative pulsed voltage

Additional details

Identifiers

DOI
10.1016/j.nimb.2005.08.203;
PII
S0168-583X(05)01540-5;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
242
Journal Issue
1-2
Journal Page Range
p. 335-337
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
14. international conference on ion beam modification of materials
Dates
5-10 Sep 2004
Place
Pacific Grove, CA (United States)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37068452
Subject category
S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ACETYLENE; DENSITY; DEPOSITION; DIAMONDS; ELECTRIC POTENTIAL; FILMS; HARDNESS; HYDROGEN; ION BEAMS; ION IMPLANTATION; PEAKS; PLASMA; RESIDUAL STRESSES
Descriptors DEC
ALKYNES; BEAMS; CARBON; ELEMENTS; HYDROCARBONS; MECHANICAL PROPERTIES; MINERALS; NONMETALS; ORGANIC COMPOUNDS; PHYSICAL PROPERTIES; STRESSES

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.