Published April 1, 1986 | Version v1
Journal article

Strain broadening of the dangling-bond resonance at the (111)Si-SiO2 interface

Creators

  • 1. Sandia National Laboratories, Albuquerque, New Mexico 87185

Description

It is observed that the linewidth and line shape of the Zeeman resonance associated with dangling bonds at the (111)Si-SiO2 interface (P/sub b/ centers) vary with the direction of the applied magnetic field. An analysis of the line shape of this resonance indicates that it can be represented analytically by the Voigt function, which is a convolution of Lorentzian and Gaussian line broadening. To a first approximation the Lorentzian component is attributed to natural line broadening and is angle independent. The Gaussian component arises from strain broadening of only g/sub perpendicular/ and not g/sub X/ giving an angle-dependent Gaussian linewidth. The strain broadening of the g dyadic is understood in terms of the molecular-orbital theory for the g anisotropy of paramagnetic dangling bonds in silicon of Watkins and Corbett. The standard deviation in the bond angle between the paramagnetic dangling bond and the adjacent bonds localized on the common silicon atom is 0.50, as deduced from our previous measurements of the 29Si hyperfine broadening. It is observed at K band that the relative intensity of the P/sub b/ resonance, as determined by double numerical integration of the measured derivative spectrum or from integration of the Voigt function, varies from 1 for Bparallel[111] to approximately 1.7 for Bparallel[110] with B/sub microwave/parallel[112]. .AE

Additional details

Publishing Information

Journal Title
Phys. Rev., B: Condens. Matter
Journal Volume
33
Journal Issue
7
Series
Phys. Rev., B: Condens. Matter.
Journal Page Range
4471-4478
ISSN
0163-1829
CODEN
PRBMD

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
17050115
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CHEMICAL BONDS; CRYSTAL DEFECTS; ELECTRONIC STRUCTURE; INTERFACES; LINE BROADENING; MAGNETO-OPTICAL EFFECTS; SILICON; SILICON OXIDES; STRAINS; VOIGT EFFECT; ZEEMAN EFFECT
Descriptors DEC
CHALCOGENIDES; CRYSTAL STRUCTURE; ELEMENTS; OXIDES; OXYGEN COMPOUNDS; SEMIMETALS; SILICON COMPOUNDS