Published November 15, 2017 | Version v1
Journal article

Experimental estimation of charge neutrality level of SiO2

  • 1. Microelectronics Department, North China University of Technology, Beijing 100041 (China)
  • 2. Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)

Description

Highlights: • The charge neutrality level (CNL) of SiO2 is experimentally obtained to be 4 eV above the VBM of SiO2. • This paper proposes a new method to experimentally obtain the CNL of oxide. • Our work confirm the feasibility of gap state model in understanding the band lineup at oxide/semiconductor structure. - Abstract: The charge neutrality level of SiO2 is experimentally extracted by investigating conduction band offset (CBO) of SiO2/Si stack with different SiO2 thicknesses using X-ray photoelectron spectroscopy. The CBO is found to be dependent on SiO2 thickness. The CNL of SiO2 is determined to be 4 eV above valence band maximum by modeling the CBO vs. thickness of SiO2 using gap states and charge neutrality level based model.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2017.06.078

Additional details

Identifiers

DOI
10.1016/j.apsusc.2017.06.078;
PII
S0169-4332(17)31733-6;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
422
Journal Page Range
p. 690-695
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.