Published November 15, 2017
| Version v1
Journal article
Experimental estimation of charge neutrality level of SiO2
- 1. Microelectronics Department, North China University of Technology, Beijing 100041 (China)
- 2. Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)
Description
Highlights: • The charge neutrality level (CNL) of SiO2 is experimentally obtained to be 4 eV above the VBM of SiO2. • This paper proposes a new method to experimentally obtain the CNL of oxide. • Our work confirm the feasibility of gap state model in understanding the band lineup at oxide/semiconductor structure. - Abstract: The charge neutrality level of SiO2 is experimentally extracted by investigating conduction band offset (CBO) of SiO2/Si stack with different SiO2 thicknesses using X-ray photoelectron spectroscopy. The CBO is found to be dependent on SiO2 thickness. The CNL of SiO2 is determined to be 4 eV above valence band maximum by modeling the CBO vs. thickness of SiO2 using gap states and charge neutrality level based model.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2017.06.078Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2017.06.078;
- PII
- S0169-4332(17)31733-6;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 422
- Journal Page Range
- p. 690-695
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 49069726
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Descriptors DEI
- SEMICONDUCTOR MATERIALS; SILICA; SILICON OXIDES; SIMULATION; STACKS; THICKNESS; VALENCE; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHALCOGENIDES; DIMENSIONS; ELECTRON SPECTROSCOPY; MATERIALS; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; SILICON COMPOUNDS; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.