Published 1992
| Version v1
Journal article
Silicon doping of GaAs single crystals
Creators
- 1. Inst. of Physics, Czechoslovak Academy of Sciences, Prague (Czechoslovakia)
Description
The silicon doped GaAs single crystals were grown by means of a horizontal Bridgman method. The relation between the free carrier concentration and silicon concentration determined by chemical analysis was examinated. (orig.)
Additional details
Publishing Information
- Journal Title
- Crystal Research and Technology
- Journal Volume
- 27
- Journal Issue
- 4
- Series
- Cryst. Res. Technol.
- Journal Page Range
- 477-479
- ISSN
- 0232-1300
- CODEN
- CRTED
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 23086043
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- BRIDGMAN METHOD; CARRIER DENSITY; CHEMICAL COMPOSITION; CRYSTAL DOPING; DOPED MATERIALS; GALLIUM ARSENIDES; MONOCRYSTALS; SILICON ADDITIONS
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CRYSTAL GROWTH METHODS; CRYSTALS; GALLIUM COMPOUNDS; MATERIALS; PNICTIDES