Published 2000
| Version v1
Journal article
Effect of Ti content on nanometric substructure and shape memory property in sputter-deposited Ti-rich Ti-Ni thin films
- 1. Tsukuba Univ., Sakura, Ibaraki (Japan). Inst. of Materials Science
- 2. National Research Inst. for Metals, Sengen, Tsukuba (Japan)
Description
Effect of Ti content on the formation of bct thin plate precipitate in sputter-deposited Ti-rich Ti-Ni thin films has been studied by high-resolution electron microscopy. This bct non-equilibrium precipitate having perfect coherency with the B2 matrix is a key factor to produce very good shape memory properties. The results indicate that the upper limit of Ti content to produce this precipitate is about 53 at. %. (orig.)
Additional details
Publishing Information
- Journal Title
- Materials Science Forum
- Journal Volume
- 327-328
- Journal Page Range
- p. 175-178
- ISSN
- 0255-5476
- CODEN
- MSFOEP
Conference
- Title
- International symposium and exhibition on shape memory materials (SMM '99)
- Dates
- 19-21 May 1999
- Place
- Kanazawa (Japan)
INIS
- Country of Publication
- Switzerland
- Country of Input or Organization
- Switzerland
- INIS RN
- 31024991
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COATINGS; ELECTRON DIFFRACTION; HEAT TREATMENTS; MARTENSITIC STEELS; NICKEL ALLOYS; PRECIPITATION; SHAPE MEMORY EFFECT; SPUTTERING; THIN FILMS; TITANIUM ALLOYS; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- ALLOYS; CARBON ADDITIONS; COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; FILMS; IRON ALLOYS; IRON BASE ALLOYS; MICROSCOPY; SCATTERING; SEPARATION PROCESSES; STEELS; TRANSITION ELEMENT ALLOYS
Optional Information
- Notes
- 7 refs.