An innovative approach for micro/nano structuring plasma polymer films
Creators
- 1. Chimie des Interactions Plasma-Surface, CIRMAP, University of Mons, Place du Parc 20, B7000 Mons (Belgium)
- 2. Instituto de Ciencia de Materiales de Sevilla (CSIC-Universidad de Sevilla), Seville E-41092 (Spain)
- 3. Materia Nova Research Center, Parc Initialis, Avenue Nicolas Copernic 1, B-7000 Mons (Belgium)
- 4. Laboratory for Chemistry of Novel Materials, CIRMAP, University of Mons, Place du Parc 20, B7000 Mons (Belgium)
Description
Highlights: • Synthesis of a bilayer system formed by two different propanethiol plasma polymers • Formation of micro/nano structured sulfur-based plasma polymers • Study of the reshaping mechanism -- Abstract: This work aims at presenting an innovative method for tailoring the morphology of functionalized plasma polymer films (PPF). The approach is based on the formation of a plasma polymer bilayer system in which the two layers differ by their chemical composition and cross-linking degree. As a case study, propanethiol-based plasma polymer films have been investigated. As revealed by a much higher S/C ratio than in the propanethiol precursor (i.e. 0.83 vs 0.33), it has been demonstrated that the bottom layer contains a large fraction of trapped sulfur-based molecules (e.g. H2S). When further covered by a denser PPF formed at higher energetic conditions, a three-dimensional morphological reorganization takes place giving rise to the micro/nano structuration of the organic material. The shape, the dimensions as well as the density of the generated structures are found to depend on the thickness of both coatings involved in the bilayer structure, offering a great flexibility for surface engineering. Annealing experiments unambiguously confirm the major role played by the sulfur-based trapped molecules for inducing the reshaping process. The whole set of data clearly paves the way for the development of an innovative approach for finely tailoring the morphology of functionalized PPF at the micro/nano scale.
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2018.12.050;
- PII
- S0040609018308691;
Publishing Information
- Journal Title
- Thin Solid Films (Print)
- Journal Volume
- 672
- Journal Page Range
- p. 26-32
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Switzerland
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 55041221
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CHEMICAL COMPOSITION; COATINGS; CROSS-LINKING; MORPHOLOGY; NANOSTRUCTURES; PLASMA; POLYMERS; SUBSTRATES; SULFUR; THICKNESS; THIN FILMS; THREE-DIMENSIONAL LATTICES
- Descriptors DEC
- CHEMICAL REACTIONS; CRYSTAL LATTICES; CRYSTAL STRUCTURE; DIMENSIONS; ELEMENTS; FILMS; NONMETALS; POLYMERIZATION
Optional Information
- Copyright
- Copyright (c) 2019 Elsevier B.V. All rights reserved.