Published February 7, 2008 | Version v1
Journal article

Study on the luminescence properties of n-ZnO/p-Si hetero-junction diode grown by MOCVD

  • 1. State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Qianjin Street 2699, Changchun 130012 (China)
  • 2. State Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams, Department of Physics, Dalian University of Technology, Dalian 116023 (China)

Description

n-ZnO/p-Si hetero-junction light emitting diodes were fabricated using a metal organic chemical vapour deposition (MOCVD) technique. Room temperature (RT) photoluminescence (PL) spectrum showed an intense main peak at 377 nm and a weak deep-level emission. The I-V characteristics of the n-ZnO/p-Si hetero-junction showed rectifying diode behaviour at different temperatures. At a low bias voltage, typical values of the ideality factors were determined to be 2.84 at 77 K and 1.94 at 300 K, indicating that the junction had good diode characteristics. RT electroluminescence (EL) was detected under forward bias, which covered a broad visible range (400-600 nm) corresponding to defect-related emission. The remarkable difference between the PL and EL spectra was ascribed to their different excitation and recombination processes. Infrared EL emission at Si band gap energy based on the n-ZnO/p-Si hetero-junction structure was also detected

Additional details

Identifiers

DOI
10.1088/0022-3727/41/3/035101;
PII
S0022-3727(08)53145-7;

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
41
Journal Issue
3
Journal Page Range
p. 035101
ISSN
0022-3727
CODEN
JPAPBE