Published October 1, 2015 | Version v1
Journal article

Analysis of the spatial filter of a dielectric multilayer film reflective cutoff filter-combination device

  • 1. Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800 (China)
  • 2. Research Center of Laser Fusion, Chinese Academy of Engineering Physics, Mianyang 621900 (China)

Description

The experiment setup of a reflecting combination device, which has more advantages than a transmitting combination device, is designed in this study. To achieve angular spectrum selectivity, only one type of reflective component is needed, so difficulties of design and preparation are reduced. A dielectric multilayer film is applied to the reflective component, and the long wave-pass coating stacks of the structure are designed. To achieve high stopband transmittance and reduce electric field intensity at a wavelength of 1053 nm, an objective function is proposed for designing an optimized coating. The final optimized coating has good spectral characteristics and a high laser-induced damage threshold. A dielectric multilayer film with high reflectance plays an important role in preparing and applying a dielectric multilayer film reflecting cutoff filter-combination device. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/24/10/104216

Additional details

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
24
Journal Issue
10
Journal Page Range
[4 p.]
ISSN
1674-1056

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47097268
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
COATINGS; DAMAGE; DIELECTRIC MATERIALS; ELECTRIC FIELDS; EQUIPMENT; LASER RADIATION; LAYERS; SPECTRA; THIN FILMS; WAVELENGTHS
Descriptors DEC
ELECTROMAGNETIC RADIATION; FILMS; MATERIALS; RADIATIONS