Published February 22, 2004
| Version v1
Journal article
Three beam photoreflectance as a powerful method to investigate semiconductor heterostructures
Description
We have proposed three beam photoreflectance (TBPR) technique as a powerful tool to investigate the nature of PR resonances associated with transitions in quantum wells (QWs) placed in a weak surface electric field. This method works as a contactless forward bias and allows changing the internal fields even down to the flat band conditions. We have shown that changes in built-in electric field by amount of a few tenths of kV/cm can modify the transition intensities significantly whereas the transition energies are being kept unchanged and no Stark shift of the QW energy levels is detected. The intensity changes make it possible to distinguish between the parity allowed and forbidden optical transitions in a quantum well
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2003.10.054;
- PII
- S0040609003014378;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 450
- Journal Issue
- 1
- Journal Page Range
- p. 71-74
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- Symposium M on optical and X-ray metrology for advanced device materials characterization
- Acronym
- E-MRS 2003 spring conference
- Dates
- 10-13 Jun 2003
- Place
- Strasbourg (France)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37016666
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAMS; ELECTRIC FIELDS; ENERGY LEVELS; QUANTUM WELLS; RESONANCE; SEMICONDUCTOR MATERIALS; SURFACES
- Descriptors DEC
- MATERIALS; NANOSTRUCTURES
Optional Information
- Copyright
- Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.