Published February 22, 2004 | Version v1
Journal article

Three beam photoreflectance as a powerful method to investigate semiconductor heterostructures

Description

We have proposed three beam photoreflectance (TBPR) technique as a powerful tool to investigate the nature of PR resonances associated with transitions in quantum wells (QWs) placed in a weak surface electric field. This method works as a contactless forward bias and allows changing the internal fields even down to the flat band conditions. We have shown that changes in built-in electric field by amount of a few tenths of kV/cm can modify the transition intensities significantly whereas the transition energies are being kept unchanged and no Stark shift of the QW energy levels is detected. The intensity changes make it possible to distinguish between the parity allowed and forbidden optical transitions in a quantum well

Additional details

Identifiers

DOI
10.1016/j.tsf.2003.10.054;
PII
S0040609003014378;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
450
Journal Issue
1
Journal Page Range
p. 71-74
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
Symposium M on optical and X-ray metrology for advanced device materials characterization
Acronym
E-MRS 2003 spring conference
Dates
10-13 Jun 2003
Place
Strasbourg (France)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37016666
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BEAMS; ELECTRIC FIELDS; ENERGY LEVELS; QUANTUM WELLS; RESONANCE; SEMICONDUCTOR MATERIALS; SURFACES
Descriptors DEC
MATERIALS; NANOSTRUCTURES

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.