Published 2004
| Version v1
Miscellaneous
Deposition of Zr-ZrOx and Y-YxOy films by reactive magnetron sputtering
Creators
- 1. Kaunas University of Technology, Department of Physics, Kaunas (Lithuania)
Description
no abstract available
Additional details
Publishing Information
- Imprint Title
- Abstracts of 5. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2004
- Imprint Pagination
- 257 p.
- Journal Page Range
- p. 204
Conference
- Title
- 5. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2004
- Dates
- 14-17 Jun 2004
- Place
- Kazimierz Dolny (Poland)
INIS
- Country of Publication
- Poland
- Country of Input or Organization
- Poland
- INIS RN
- 36060166
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- No Abstract, Conference, Non-conventional Literature
- Descriptors DEI
- CATHODE SPUTTERING; CRYSTAL STRUCTURE; CURRENT DENSITY; DEPOSITION; ELLIPSOMETRY; FLOW RATE; MAGNETRONS; OPTICAL PROPERTIES; OXYGEN; SPECTROPHOTOMETRY; X-RAY DIFFRACTION; YTTRIUM; YTTRIUM OXIDES; ZIRCONIUM; ZIRCONIUM OXIDES
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; MEASURING METHODS; METALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SCATTERING; SPUTTERING; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; YTTRIUM COMPOUNDS; ZIRCONIUM COMPOUNDS