Published March 1, 2019
| Version v1
Journal article
Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences)
Creators
- Abramenko, D B1
- Antsiferov, P S1
- Astakhov, D I1
- Gayazov, R R1
- Dorokhin, L A1
- Ivanov, V V1
- Koshelev, K N1
- Krivokorytov, M S1
- Krivtsun, V M1
- Medvedev, V V1
- Ryabtsev, A N1
- Sidelnikov, Yu V1
- Snegirev, E P1
- Vinokhodov, A Yu2
- Lash, A A2
- Vichev, I Yu3
- Grushin, A S3
- Kim, D A3
- Krainov, P V4
- Lakatosh, B V4
- and others
- 1. Institute of Spectroscopy, Russian Academy of Sciences, ul. Fizicheskaya 5, 108840 Troitsk, Moscow (Russian Federation)
- 2. EUV Labs, Ltd., ul. Promyshlennaya 2B, 108841 Troitsk, Moscow (Russian Federation)
- 3. Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Miusskaya pl. 4, 125047 Moscow (Russian Federation)
- 4. Moscow Institute of Physics and Technology (State University), Institutskii per. 9, 141700 Dolgoprudnyi, Moscow region (Russian Federation)
Description
We report on the development of plasma-based sources of extreme ultraviolet radiation for the next-generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources. (conferences and symposia)
Availability note (English)
Available from http://dx.doi.org/10.3367/UFNe.2018.06.038447Additional details
Identifiers
Publishing Information
- Journal Title
- Physics Uspekhi
- Journal Volume
- 62
- Journal Issue
- 3
- Journal Page Range
- p. 304-314
- ISSN
- 1063-7869
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51068929
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- EXTREME ULTRAVIOLET RADIATION; INSPECTION; PLASMA; SPECTROSCOPY
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; RADIATIONS; ULTRAVIOLET RADIATION