Published October 2001 | Version v1
Miscellaneous Open

Localization of implanted impurities in silicon

  • 1. Iordan-Al-Balga Applied University, Madaba (Jordan)
  • 2. Belaruski dzyarzhawny univ., Minsk (Belarus)

Description

Localization of implanted boron in the Si crystal nodes depending on current ions density was investigated by X-ray diffraction and electrophysical methods. With increase of current ions density localization of boron atoms in the nodes grows that is defined by increase of instantaneous vacancy concentration and suppression of impurity replacement from the nodes by interstitial Si atoms

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Part of:
Proceedings of the Fourth international conference 'Interaction of radiation with solids'

Additional details

Additional titles

Original title (Russian)
Локализация имплантируемых примесей в кремнии

Publishing Information

Imprint Place
Minsk (Belarus)
ISBN
985-445-236-0
Imprint Title
Proceedings of the Fourth international conference 'Interaction of radiation with solids'
Imprint Pagination
396 p.
Journal Page Range
p. 214-216
Report number
INIS-BY--059

Conference

Title
4. international conference 'Interaction of radiation with solids'
Original Conference Title
Chetvertaya mezhdunarodnaya konferentsiya 'Vzaimodejstvie izluchenij s tverdym telom'
Dates
3-5 Oct 2001
Place
Minsk (Belarus)

Optional Information

Notes
8 refs., 3 figs. Imprint:Materialy chetvertoj mezhdunarodnoj konferentsii 'Vzaimodejstvie izluchenij s tverdym telom'