Published April 1, 2008 | Version v1
Journal article Metadata-only

CoCrPt-SiO2 granular-type longitudinal media on Ru underlayer for sputtered tape applications

Creators

  • 1. Data Storage Systems Center, Department of Electrical and Computer Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213 (United States)

Description

CoCrPt-SiO2 films for use as thin film tape media have been investigated. Bias sputtering and high Ar pressure were utilized to achieve desirable media properties (good in-plane orientation and enhanced grain decoupling) in these media. The in-plane orientation of the bias sputtered CoCrPt-SiO2 magnetic layer was well maintained even at a high content of SiO2 as Ru was used as an underlayer and deposited at high Ar pressure. Films of (10.0) textured CoCrPt-SiO2 on a Ru underlayer showed a large in-plane coercivity of 4000 Oe and transmission electron microscopy revealed an average grain size of about 10 nm, well decoupled by the oxide. The in-plane coercivity was a strong function of the Ru thickness

Additional details

Identifiers

DOI
10.1063/1.2885068;

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
103
Journal Issue
7
Journal Page Range
p. 07F545-07F545.3
ISSN
0021-8979
CODEN
JAPIAU

Conference

Title
52. annual conference on magnetism and magnetic materials
Dates
5-9 Nov 2007
Place
Tampa, FL (United States)

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
40017988
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHROMIUM ALLOYS; COBALT ALLOYS; COERCIVE FORCE; DEPOSITION; GRAIN ORIENTATION; GRAIN SIZE; MAGNETIC TAPES; PLATINUM ALLOYS; RUTHENIUM; SILICON OXIDES; SPUTTERING; TEXTURE; THICKNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY
Descriptors DEC
ALLOYS; CHALCOGENIDES; DIMENSIONS; ELECTRON MICROSCOPY; ELEMENTS; FILMS; MAGNETIC STORAGE DEVICES; MEMORY DEVICES; METALS; MICROSCOPY; MICROSTRUCTURE; ORIENTATION; OXIDES; OXYGEN COMPOUNDS; PLATINUM METAL ALLOYS; PLATINUM METALS; REFRACTORY METALS; SILICON COMPOUNDS; SIZE; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENTS

Optional Information

Notes
(c) 2008 American Institute of Physics