Published December 19, 2005 | Version v1
Journal article

Deployment of titanium thermal barrier for low-temperature carbon nanotube growth

  • 1. Advanced Technology Centre, Sowerby Building, BAE SYSTEMS, Filton FPC 267, Bristol BS34 7QW (United Kingdom)
  • 2. Nano-Electronic Centre, Advanced Technology Institute, School of Electronics and Physical Science, University of Surrey, Guildford, Surrey GU2 7XH (United Kingdom)

Description

Chemical vapor-synthesized carbon nanotubes are typically grown at temperatures around 600 deg. C. We report on the deployment of a titanium layer to help elevate the constraints on the substrate temperature during plasma-assisted growth. The growth is possible through the lowering of the hydrocarbon content used in the deposition, with the only source of heat provided by the plasma. The nanotubes synthesized have a small diameter distribution, which deviates from the usual trend that the diameter is determined by the thickness of the catalyst film. Simple thermodynamic simulations also show that the quantity of heat, that can be distributed, is determined by the thickness of the titanium layer. Despite the lower synthesis temperature, it is shown that this technique allows for high growth rates as well as better quality nanotubes

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
87
Journal Issue
25
Journal Page Range
p. 253115-253115.3
ISSN
0003-6951
CODEN
APPLAB

INIS

Optional Information

Notes
(c) 2005 American Institute of Physics