Published May 2009 | Version v1
Journal article Metadata-only

Diffusion study of nitrogen implanted into α-Hf using the nuclear resonance technique

Creators

  • 1. Instituto de Fisica, UFRGS, Caixa Postal 15051, Porto Alegre, RS (Brazil)
  • 2. Consejo Nacional de Investigaciones Cientificas y Tecnicas (CONICET), Buenos Aires (Argentina)

Description

The diffusion of nitrogen in α-Hf was studied in the temperature range of (823-1123) K using the ion implantation and nuclear resonance techniques. The measurements show that the diffusion coefficients follow the Arrhenius behavior D(T)=D0exp(-Q/RT) with D0=(5.5±2.1) x 10-7 m2/s and Q=(228±1) kJ/mol. A comparison of the present results with the previous one is done. (orig.)

Availability note (English)

Available from: http://dx.doi.org/10.1007/s00339-008-4927-y

Additional details

Identifiers

DOI
10.1007/s00339-008-4927-y;

Publishing Information

Journal Title
Applied Physics. A, Materials Science and Processing
Journal Volume
95
Journal Issue
2
Journal Page Range
p. 501-505
ISSN
0947-8396
CODEN
APAMFC

INIS

Country of Publication
Germany
Country of Input or Organization
Germany
INIS RN
40035253
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Numerical Data
Descriptors DEI
ACTIVATION ENERGY; ARRHENIUS EQUATION; DEPTH; DIFFUSION; EXPERIMENTAL DATA; HAFNIUM-ALPHA; ION IMPLANTATION; KEV RANGE 10-100; NITROGEN; NITROGEN IONS; SPATIAL DISTRIBUTION; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0400-1000 K; TEMPERATURE RANGE 1000-4000 K
Descriptors DEC
CHARGED PARTICLES; DATA; DIMENSIONS; DISTRIBUTION; ELEMENTS; ENERGY; ENERGY RANGE; EQUATIONS; HAFNIUM; INFORMATION; IONS; KEV RANGE; METALS; NONMETALS; NUMERICAL DATA; REFRACTORY METALS; TEMPERATURE RANGE; TRANSITION ELEMENTS