Published September 2009 | Version v1
Journal article

Effect of a high temperature AlN buffer layer grown by initially alternating supply of ammonia on AlGaN/GaN heterostuctures

  • 1. Key Laboratory of Fundamental Science for National Defense on Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071 (China)

Description

The effect of a high temperature AlN buffer layer grown by the initially alternating supply of ammonia (IASA) method on AlGaN/GaN heterostructures was studied. The use of AlN by the IASA method can effectively increase the crystalline quality and surface morphology of GaN. The mobility and concentration of 2DEG of AlGaN/GaN heterostuctures was also ameliorated.

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/30/9/093001

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
30
Journal Issue
9
Journal Page Range
[4 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42068424
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ALUMINIUM NITRIDES; AMMONIA; BUFFERS; GALLIUM NITRIDES; LAYERS; TEMPERATURE RANGE 0400-1000 K
Descriptors DEC
ALUMINIUM COMPOUNDS; GALLIUM COMPOUNDS; HYDRIDES; HYDROGEN COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; NITROGEN HYDRIDES; PNICTIDES; TEMPERATURE RANGE