Published September 2009
| Version v1
Journal article
Effect of a high temperature AlN buffer layer grown by initially alternating supply of ammonia on AlGaN/GaN heterostuctures
Creators
- 1. Key Laboratory of Fundamental Science for National Defense on Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071 (China)
Description
The effect of a high temperature AlN buffer layer grown by the initially alternating supply of ammonia (IASA) method on AlGaN/GaN heterostructures was studied. The use of AlN by the IASA method can effectively increase the crystalline quality and surface morphology of GaN. The mobility and concentration of 2DEG of AlGaN/GaN heterostuctures was also ameliorated.
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/30/9/093001Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 30
- Journal Issue
- 9
- Journal Page Range
- [4 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42068424
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM NITRIDES; AMMONIA; BUFFERS; GALLIUM NITRIDES; LAYERS; TEMPERATURE RANGE 0400-1000 K
- Descriptors DEC
- ALUMINIUM COMPOUNDS; GALLIUM COMPOUNDS; HYDRIDES; HYDROGEN COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; NITROGEN HYDRIDES; PNICTIDES; TEMPERATURE RANGE