Published June 24, 2011 | Version v1
Journal article

Facile, hetero-sized nanocluster array fabrication for investigating the nanostructure-dependence of nonvolatile memory characteristics

  • 1. National Nanofab Center, Korea Advanced Institute of Science and Technology, Daejeon 305-806 (Korea, Republic of)

Description

A facile fabrication of a hetero-sized nanocluster array has been demonstrated by using inert-gas condensation at room temperature. The array consisted of 1.5 and 3.2 nm sized gold clusters. The nonvolatile memory characteristics of a memory cell that had a hetero-sized nanocluster array to be used as a charge-trapping layer were compared to those of two cells that had 1.5 and 3.2 nm sized cluster arrays, respectively. While the average cluster size or the average number of electrons trapped in a cluster was reflected in the programming/erasing characteristics, the nanostructure effect was revealed in the retention characteristics, i.e. the proposed cell was found to have the gentlest degradation of the memory window. This can be explained by a preferential pathway for charge-carrier redistribution, caused by the ionization potential difference between the two nanoclusters of different sizes.

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/22/25/254018

Additional details

Identifiers

DOI
10.1088/0957-4484/22/25/254018;
PII
S0957-4484(11)73530-9;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
22
Journal Issue
25
Journal Page Range
[5 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43026838
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
CHARGE CARRIERS; ELECTRONS; FABRICATION; GOLD; IONIZATION POTENTIAL; LAYERS; NANOSTRUCTURES; RETENTION
Descriptors DEC
ELEMENTARY PARTICLES; ELEMENTS; FERMIONS; LEPTONS; METALS; TRANSITION ELEMENTS