Published 2013
| Version v1
Miscellaneous
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Deposition of cobalt oxide films with interruption of the O2 flow by reactive DC sputtering
Creators
- 1. Universidade Estadual Paulista (UNESP), Bauru (Brazil)
- 2. Univ. Politecnica de Valencia (Spain)
Description
no abstract available
Files
50050490.pdf
Files
(47.8 kB)
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Additional details
Publishing Information
- Imprint Pagination
- 1 p.
- Report number
- INIS-BR--22313
Conference
- Title
- 12. Brazilian MRS meeting
- Dates
- 29 Sep - 3 Oct 2013
- Place
- Campos do Jordao, SP (Brazil)
INIS
- Country of Publication
- Brazil
- Country of Input or Organization
- Brazil
- INIS RN
- 50050490
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- No Abstract, Conference
- Descriptors DEI
- COBALT OXIDES; DEPOSITION; FILMS; GAS FLOW; GLASS; OXYGEN; SCANNING ELECTRON MICROSCOPY; SILICA; SPUTTERING; SUSPENSIONS; ULTRAVIOLET RADIATION; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; COBALT COMPOUNDS; COHERENT SCATTERING; DIFFRACTION; DISPERSIONS; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELEMENTS; FLUID FLOW; MICROSCOPY; MINERALS; NONMETALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SCATTERING; TRANSITION ELEMENT COMPOUNDS