Published November 26, 2014 | Version v1
Journal article

Chronological change of electrical resistance in GeCu2Te3 amorphous film induced by surface oxidation

  • 1. Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 4, 1-1-1 Higashi, Tsukuba 305–8562 (Japan)
  • 2. Department of Materials Science, Tohoku University, 6-6-11 Aoba-yama, Aoba-ku, Sendai 980–8579 (Japan)
  • 3. New Industry Creation Hatchery Center, Tohoku University, 6-6-11, Aoba-yama, Aoba-ku, Sendai 980–8579 (Japan)

Description

Unusual chronological electrical resistance change behavior was investigated for amorphous GeCu2Te3 phase change material. More than a 1 order decrease of electrical resistance was observed in the air even at room temperature. The resistance of the amorphous film gradually increased with increasing temperature and then showed a drop upon crystallization. Such unusual behavior was attributed to the oxidation of the amorphous GeCu2Te3 film. From the compositional depth profile measurement, the GeCu2Te3 film without any capping layer was oxidized in air at room temperature and the formed oxide was mainly composed of germanium oxide. Consequently, a highly-conductive Cu-rich layer was formed in the vicinity of the surface of the film, which reduced the total resistance of the film. The present results could provide insight into the chronological change of electrical resistance in amorphous chalcogenide materials, indicating that not only relaxation of the amorphous, but also a large atomic diffusion contributes to the chronological resistance change. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/47/47/475302

Additional details

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
47
Journal Issue
47
Journal Page Range
[8 p.]
ISSN
0022-3727
CODEN
JPAPBE