Published November 1, 2020 | Version v1
Journal article

Design and performance characterisation of the HAPG von Hámos Spectrometer at the High Energy Density Instrument of the European XFEL

  • 1. European XFEL, Holzkoppel 4, 22869 Schenefeld (Germany)
  • 2. Helmholtz-Zentrum Dresden-Rossendorf, Bautzner Landstr. 400, 01328 Dresden (Germany)
  • 3. Deutsches Elektronen-Synchrotron DESY, Notkestr. 85, 22607 Hamburg (Germany)
  • 4. Institut de Minéralogie, de Physique des Matériaux, et de Cosmochimie (IMPMC), Sorbonne Université, UMR CNRS 7590, Muséum National d'Histoire Naturelle, 75005 Paris (France)
  • 5. Department of Physics, University of California, Berkeley, California 94720 (United States)
  • 6. SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States)

Description

The von Hámos spectrometer setup at the HED instrument of the European XFEL is described in detail. The spectrometer is designed to be operated primarily between 5 and 15 keV to complement the operating photon energy range of the HED instrument. Four Highly Annealed Pyrolitic Graphite (HAPG) crystals are characterised with thicknesses of 40 μm or 100 μm and radius-of-curvature 50 mm or 80 mm, in conjunction with either an ePix100 or Jungfrau detector. The achieved resolution with the 50 mm crystals, operated between 6.5 and 9 keV, matches that reported previously: 8 eV for a thickness of 40 μm, whereas, with an 80 mm crystal of thickness 40 μm, the resolution exceeds that expected. Namely, a resolution of 2 eV is demonstrated between 5–6 keV implying a resolving power of 2800. Therefore, we posit that flatter HAPG crystals, with their high reflectivity and improved resolving power, are a powerful tool for hard x-ray scattering and emission experiments allowing unprecedented measurements of collective scattering in a single shot.

Availability note (English)

Available from http://dx.doi.org/10.1088/1748-0221/15/11/P11033

Additional details

Publishing Information

Journal Title
Journal of Instrumentation
Journal Volume
15
Journal Issue
11
Journal Page Range
p. P11033
ISSN
1748-0221