Published 1983
| Version v1
Miscellaneous
Open
Field ion microscopy of silicon
Creators
- 1. Osaka Univ. (Japan)
- 2. Fritz-Haber-Institut der Max-Planck-Gesellschaft, Berlin (Germany, F.R.)
Description
Field ion images of silicon when using hydrogen, silane, oxygen and nitrogen as image gas are compared. (G.Q.)
Files
15000202.pdf
Files
(148.6 kB)
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Additional details
Publishing Information
- Imprint Title
- 3S'83 Symposium on Surface Science. Contributions
- Imprint Pagination
- 319 p.
- Journal Page Range
- p. 186-191.
- Report number
- INIS-mf--8901
Conference
- Title
- 3S'83 Symposium on surface science.
- Dates
- 31 Jan - 4 Feb 1983.
- Place
- Obertraun (Austria).
INIS
- Country of Publication
- Austria
- Country of Input or Organization
- Austria
- INIS RN
- 15000202
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHEMISORPTION; EVAPORATION; HYDROGEN; IMAGES; ION MICROSCOPY; NITROGEN; OXYGEN; SILANES; SILICON; TEMPERATURE DEPENDENCE
- Descriptors DEC
- CHEMICAL REACTIONS; ELEMENTS; HYDRIDES; HYDROGEN COMPOUNDS; MICROSCOPY; NONMETALS; PHASE TRANSFORMATIONS; SEMIMETALS; SEPARATION PROCESSES; SILICON COMPOUNDS