Published July 1994 | Version v1
Journal article Metadata-only

Furnace for substrate heating in a molecular-beam epitaxy facility

Creators

  • 1. AN SSSR, Moscow (Russian Federation). Inst. Kristallografii

Description

A furnace is described for maintenance of a given temperature of substrate heating in a molecular-beam epitaxy facility. In the operation range 200-700 deg C temperature variations along the sample surface (20 mm diameter) is not more 2-5 deg C. Substrate temperature stabilization is realized with the time delay of 5 min after heater temperature stabilization

Additional details

Additional titles

Original title (Russian)
Печь для нагрева подложек в установке молекулярно-лучевой эпитаксии

Publishing Information

Journal Title
Pribory i Tekhnika Ehksperimenta
Journal Issue
no.4
Journal Page Range
p. 189-190.
ISSN
0032-8162
CODEN
PRTEAJ

INIS

Country of Publication
Russian Federation
Country of Input or Organization
Russian Federation
INIS RN
26026988
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
DIAGRAMS; EPITAXY; FURNACES; HEATING; MOLECULAR BEAMS; PERFORMANCE; STABILITY; SUBSTRATES; TEMPERATURE MEASUREMENT
Descriptors DEC
BEAMS; CRYSTAL GROWTH METHODS; INFORMATION