Published July 1, 2019
| Version v1
Journal article
Investigation of ultrathin carbon film growth and etching by in-situ X-ray reflectivity
Creators
- 1. Moscow Aviation Institute (National Research University), Moscow (Russian Federation)
- 2. LLC "NTC IGD", Lyubertsy, Moscow Region (Russian Federation)
Description
The results of studies of carbon films in the process of their growth and etching in plasma of radio-frequency discharge in real time by in-situ X-ray reflectometry are presented. The film thickness, growth rate, density and surface roughness were calculated from the time dependence of the reflection coefficient of x-rays at a wavelength of 1.54 A. A method for the production of carbon films with a super-smooth surface was proposed. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/1281/1/012001Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 1281
- Journal Issue
- 1
- Journal Page Range
- [4 p.]
- ISSN
- 1742-6596
Conference
- Title
- 14. International Conference on Films and Coatings
- Dates
- 14-16 May 2019
- Place
- Saint Petersburg (Russian Federation)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 53043217
- Subject category
- S36: MATERIALS SCIENCE; S73: NUCLEAR PHYSICS AND RADIATION PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CARBON; DENSITY; PLASMA; RADIOWAVE RADIATION; REFLECTIVITY; SURFACES; THIN FILMS; TIME DEPENDENCE; X RADIATION
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELEMENTS; FILMS; IONIZING RADIATIONS; NONMETALS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; RADIATIONS; SURFACE PROPERTIES