Published July 15, 2007 | Version v1
Journal article

Electron field emission from boron doped microcrystalline diamond

  • 1. Faculdade de Engenharia Eletrica e Computacao, Departamento de Semicondutores, Instrumentos e Fotonica, Universidade Estadual de Campinas, Av. Albert Einstein N.400, 13 083-852 Campinas, SP (Brazil)
  • 2. Nanoscale Systems Integration Group, School of Electronics and Computer Science, University of Southampton, SO17 1BJ (United Kingdom)
  • 3. Faculdade de Tecnologia de Sao Paulo, FATEC-SP, CEETEPS, UNESP, Praca Coronel Fernando Prestes, 30 Sao Paulo 01124-060, SP (Brazil)

Description

Field emission properties of hot filament chemical vapor deposited boron doped polycrystalline diamond have been studied. Doping level (N B) of different samples has been varied by the B/C concentration in the gas feed during the growth process and doping saturation has been observed for high B/C ratios. Threshold field (E th) for electron emission as function of B/C concentration has been measured, and the influences of grain boundaries, doping level and surface morphology on field emission properties have been investigated. Carrier transport through conductive grains and local emission properties of surface sites have been figured out to be two independent limiting effects in respect of field emission. Emitter current densities of 500 nA cm-2 were obtained using electric fields less than 8 V/μm

Additional details

Identifiers

DOI
10.1016/j.apsusc.2007.03.023;
PII
S0169-4332(07)00459-X;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
253
Journal Issue
18
Journal Page Range
p. 7381-7386
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.