Published 1985
| Version v1
Journal article
Channeling measurement of residual damage in silicon
Creators
- 1. Ceskoslovenska Akademie Ved, Rez. Ustav Jaderne Fyziky
- 2. Ceske Vysoke Uceni Technicke, Prague (Czechoslovakia). Fakulta Elektrotechnicka
- 3. Tesla, Roznov pod Radhostem (Czechoslovakia)
- 4. Ceske Vysoke Uceni Technicke, Prague (Czechoslovakia). Fakulta Jaderna a Fysikalne Inzenyrska
Description
no abstract available
Additional details
Publishing Information
- Journal Title
- Czech. J. Phys.
- Journal Volume
- 35
- Journal Issue
- 4
- Series
- Czech. J. Phys.
- Journal Page Range
- 465-468
- ISSN
- 0011-4626
- CODEN
- CZYPA
INIS
- Country of Publication
- Czech Republic
- Country of Input or Organization
- Serbia and Montenegro
- INIS RN
- 17037662
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- ANNEALING; ARSENIC ADDITIONS; BACKSCATTERING; CHANNELING; CRYSTAL DEFECTS; CRYSTAL LATTICES; HELIUM 4 BEAMS; ION IMPLANTATION; LASER RADIATION; MONOCRYSTALS; SILICON
- Descriptors DEC
- BEAMS; CRYSTAL STRUCTURE; CRYSTALS; ELECTROMAGNETIC RADIATION; ELEMENTS; HEAT TREATMENTS; ION BEAMS; RADIATIONS; SCATTERING; SEMIMETALS
Optional Information
- Notes
- Letter-to-the-editor.